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• Next-generation lithography — (NGL) is a term used in integrated circuit manufacturing to describe the lithography technologies slated to replace photolithography. As of 2009 the most advanced form of photolithography is immersion lithography, in which water is used as an… …   Wikipedia

• Computational lithography — (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the resolution attainable through photolithography. Computational lithography has come to the forefront of photolithography in 2008 as …   Wikipedia

• Comparison of layout engines (Scalable Vector Graphics) — Scalable Vector Graphics SXBL SVG Working Group SVG filter effects Precision Graphics Markup Language Vector Markup Language XHTML+MathML+SVG SVG animation Comparison of layout engines (SVG) …   Wikipedia

• Nuklearkatastrophe von Fukushima — Satellitenfoto der Reaktorblöcke 1 bis 4 (von rechts nach links) am 16. März 2011 nach mehreren Explosionen und Bränden. Als Nuklearkatastrophe von Fukushima werden eine Reihe von katastrophalen Unfällen und schweren Störfällen im… …   Deutsch Wikipedia

• EUV-Lithografie — (auch kurz EUVL) ist ein Fotolithografie Verfahren, das elektromagnetische Strahlung mit einer Wellenlänge von 13,5 nm (91,82 eV) nutzt, sogenannte extrem ultraviolette Strahlung (englisch extreme ultra violet, EUV). Dies soll es… …   Deutsch Wikipedia

• AMD K10 — The AMD K10 is AMD s latest microprocessor architecture. Though there were once reports that the K10 had been cancelled [http://www.theinquirer.net/?article=27421 AMD s K10 is delayed or dead] , The Inquirer] , the first third generation Opteron… …   Wikipedia

• Original Chip Set — The Original Chip Set (OCS) was a chipset used in the earliest Commodore Amiga computers and defined the Amiga s graphics and sound capabilities. It was succeeded by the slightly improved Enhanced Chip Set (ECS) and greatly improved Advanced… …   Wikipedia

• Carbon dioxide — Carbon dioxide …   Wikipedia

• 65 nanometer — The 65 nanometer (65 nm) process is an advanced lithographic node used in volume CMOS semiconductor fabrication. Printed linewidths (i.e., transistor gate lengths) can reach as low as 25 nm on a nominally 65 nm process, while the pitch between… …   Wikipedia

• Design closure — is the process by which a VLSI design is modified from its initial description to meet a growing list of design constraints and objectives. Every step in the IC design (such as static timing analysis, placement, routing, and so on) is already… …   Wikipedia

• Chlorine — This article is about the chemical element. For the bleach, see Sodium hypochlorite. For the upcoming film, see Chlorine (film). sulfur ← chlorine → argon F ↑ Cl ↓ Br …   Wikipedia